Journal of Research and Development
Open Access

France

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• Extended Abstract   
  Mass Spectrometry 2017 : Knudsen cell applied to the investigation of organometallic precursors vapors. - Ioana Nuta - Orleans’s University
  Author(s): Ioana Nuta
  
  Introduction In the field of microelectronics, the continuous decreasing size of integrated circuits (IC) silicon devices requires improvement of the manufactory Chemical Vapour Deposition (CVD) and Atomic Layer Deposition (ALD) processes as well as raw materials used as molecule sources. To achieve low temperature deposition of pure and conformal films, very reactive precursors leading to completely self-limiting surface reactions are needed. Pentakis(dimethylamido) tantalum (PDMAT) is the most common tantalum source for the deposition of TaN layers which are used as barriers to prevent copper diffusion into silicon and dielectric in multilevel metal.. View More»
  

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